Scribing of
ITO-coatings using a Q-switched Nd:YAG laser
S. C. Tama, Y. H. Chenb, H. Y.
Zhengb, and W. L. Chenc
(a) School of Electrical & Electronic Engineering Nanyang
Technological University, Nanyang Avenue, Singapore 639798
(b) Gintic Institute of Manufacturing Technology
71 Nanyang Drive, Singapore 638075
(c) Waterjet International Pte Ltd 202 Innovation Centre
Nanyang Avenue, Singapore 639798
ABSTRACT
This paper describes the results of optimising three process
variables (control factors) to achieve a narrow line width in
laser engraving of ITO conductive coatings using the Taguchi
technique of experimental design. The laser used is a NEC
Q-switched continuous wave (CW) Nd:YAG laser operating at a
wavelength of 1.064 um. The three process variables explored are:
Q-switch frequency, speed of X-Y stage, and attenuator ratio of
laser power. The various parameters were assigned to an L9
orthogonal array. The experiments were conducted with two
repetitions each of which employs complete randomization. It was
found that a narrow line width could be achieved with a Q-switch
frequency of 25 kHz, scribing speed of 2000 mm/min, and beam
attenuator setting of 35. A confirmation experiment of was
carried out and the results fell within the predicted 95%
confidence interval.
KEYWORDS: Nd:YAG laser, laser
scribing, ITO-coating, Taguchi technique
Reprinted from Proc. of SPIE, Vol. 3184
(1997), 186-194
|